TLM fit
Uses Quokka3's optimizer to fit resistance-test-structure simulations for the biTLM method, discriminating individual contact resistivities of passivating contacts.
This example demonstrates curve-fitting Quokka3 simulations for the biTLM method, using the optimizer functionality together with resistance-test-structure simulations. It targets full-area passivating contacts that are metallized only locally — such as industrial n-TOPCon or HJT cells — where several contact resistances are relevant rather than a single metal-semiconductor resistance.
The biTLM method extends the standard TLM (transmission line method): a TLM measurement is taken with and without full rear metallization to change the current path, and the results are fitted to numerical simulations to discriminate the individual contact resistivities.
What this example covers:
- Quokka3’s optimizer applied to resistance-test-structure simulations
- The biTLM extension of standard TLM (with/without full rear metallization)
- Discriminating individual contact resistivities of locally metallized passivating contacts
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